wafer40 {npregderiv} | R Documentation |
n
=7755 substrate's deflection measurements before and after the thin film deposition in two radial directions.The data frame on the deflection measurements is described and analyzed in the article of Savchuk and Volinsky (2020).
wafer40
The data frame has five variables:
design points (separated by 0.000005 m);
deflections measurements (in m) before film deposition at 0 degrees;
deflections measurements (in m) after film deposition at 0 degrees;
deflections measurements (in m) before film deposition at 90 degrees;
deflections measurements (in m) after film deposition at 90 degrees.
Savchuk, O., Volinsky, A.A. (2020). “Nonparametric estimation of SiC film residual stress from the wafer profile”.
# EXAMPLE: Plotting scatter plot of deflection in the case of 0 degrees before the film
# deposition. Note: position is displayed in mm, whereas the deflection is displayed in
# micrometers. No smoothing is used. The original n=7755 data points are plotted.
dev.new()
plot(wafer40$x_dat*1000,wafer40$y_before_0*1000000,pch=20,
main="Deflection BEFORE film deposition. Angle: 0 degrees.",xlab="",ylab="",
cex.axis=2,cex.main=2)
title(ylab=expression(paste("deflection, ", mu, "m")), xlab="position, mm",
line=2.25, cex.lab=2)